Lurie Nanofabrication Facility (LNF)
provides advanced micro- and nano-fabrication equipment and expertise to enable cutting edge research.
Contacts
Sandrine Martin, PhD
734-277-2365
info@LNF.umich.edu
Location
Electrical & Computer Engineering (EECS) Building
1301 Beal Ave, Ann Arbor, MI
Engineering
Who We Serve
University of Michigan Researchers and External Researchers
Core Summary
The University of Michigan Lurie Nanofabrication Facility (LNF) is a state-of-the-art shared clean-room facility that provides advanced micro- and nano-fabrication equipment and expertise to enable cutting edge research, from semiconductor materials and devices, biotechnology, medical devices, solid-state lighting, energy and unconventional materials and processing technologies. The LNF’s technical staff maintain the LNF facilities and tools, provide training and support to users, and perform process services.
Services
- Onsite Access
24/7 hands-on independent access to micro/nanofabrication equipment and capabilities,
- Process Services
Fabrication Provided by LNF Staff,
Equipment
- ALD Fiji
Veeco, Equipment Available For Use - ALD OpAl
Oxofrd, Equipment Available For Use - Annealing Furnace
Tempress, Equipment Available For Use - Annealing Furnace ST1800C-888
Sentro-Tech, Equipment Available For Use - Atomic Force Microscope Icon
Veeco, Equipment Available For Use - Bio-Safety Cabinet
- Bond Aligner 620
EV Group, Equipment Available For Use - Centrifuge
- Chemical Bench
JST, Equipment Available For Use - Chemical Mechanical Polishing 6EC
Strasbaugh, Equipment Available For Use - Confocal Microscope OLS 4000 LEXT
Olympus, Equipment Available For Use - Contact Aligner / Bond Aligner MA/BA-6
Suss, Equipment Available For Use - Contact Aligner MA-6
Suss, Equipment Available For Use - Contact Aligner MJB 45S
Suss, Equipment Available For Use - Contact Aligner MJB3
Suss, Equipment Available For Use - Convection Oven
Lindberg, Equipment Available For Use - Critical Point Drying Automegasamdri 915B
Tousimi, Equipment Available For Use - Deep UV, Ozone Treatment PL16
SenLights, Equipment Available For Use - Developer CEE
Brewer Science, Equipment Available For Use - Dicing Saw 7100
ADT, Equipment Available For Use - Diffusion Furnace
Tempress, Equipment Available For Use - Dip Pen Nanolithography DPN 5000
NanoInk, Equipment Available For Use - E-beam Evaporator
- E-beam Evaporator Cooke
- E-beam Evaporator SJ-20
- E-beam Evaporator SJ-26
- E-beam Lithography JBX6300 FS
JEOL, Equipment Available For Use - E-beam/Thermal Evaporator Evovac
Angstrom Engineering, Equipment Available For Use - Etching/Release Xetch X.3.B
Xactix, Equipment Available For Use - Flip Chip Bonder Lambda
FineTech, Equipment Available For Use - Fluorescent Microscope BX51
Olympus, Equipment Available For Use - FTIR Microscope and Bench Cary 620/670
Agilent, Equipment Available For Use - Goniometer 200-U1
Rame Hart, Equipment Available For Use - Image Reversal Oven 310TA €
Yield Engineering Systems, Equipment Available For Use - Incubator
- Infra-Red Microscope BX51
Olympus, Equipment Available For Use - Inkjet Printer MP-2831
Dimatix, Equipment Available For Use - Ion Mill Nanoquest II
IntlVac, Equipment Available For Use - Lapper PM5
Logitech, Equipment Available For Use - LPCVD Furnace
Tempress, Equipment Available For Use - Mask Cleaner PSC 122M
Sitek Process Solutions, Equipment Available For Use - Mask Making, Direct Write uPG 501
Heidelberg, Equipment Available For Use - Megasonic Cleaner CL200
Suss, Equipment Available For Use - Optical Profilometer New View 5000
Zygo, Equipment Available For Use - Oxidation Furnace
Tempress, Equipment Available For Use - Parylene Deposition System PDS2035
SCS, Equipment Available For Use - PECVD P5000
Applied Materials, Equipment Available For Use - PECVD ULTRADEP 2000
GSI, Equipment Available For Use - Photoresist Track Coater/Developer ACS 200
Suss, Equipment Available For Use - Plasma Cleaner 1000P
Glen, Equipment Available For Use - Plasma Etching CV200RFS(E)
Yield Engineering Systems, Equipment Available For Use - Rapid Thermal Annealing RTP 100
Jetfirst, Equipment Available For Use - Rapid Thermal Annealing RTP 150
Jetfirst, Equipment Available For Use - Reactive Ion Etcher (RIE) 790
Plasmatherm, Equipment Available For Use - Reactive Ion Etcher (RIE) 9400
Lam, Equipment Available For Use - Reactive Ion Etcher (RIE) AOE
SPTS, Equipment Available For Use - Reactive Ion Etcher (RIE) P5000
Applied Materials, Equipment Available For Use - Reactive Ion Etcher (RIE) Pegasus
SPTS, Equipment Available For Use - Reactive Ion Etcher (RIE) PlasmaLab
Oxford, Equipment Available For Use - Reflectometer 6100
Nanospec, Equipment Available For Use - Scanning Electron Microscope SU8000 In-line
Hitachi, Equipment Available For Use - Spectroscopic Ellipsometer M-2000
Woollam, Equipment Available For Use - Spinner CEE 100CB
Brewer Science, Equipment Available For Use - Spinner CEE 200X
Brewer Science, Equipment Available For Use - Sputtering Endeavor M1
OEM, Equipment Available For Use - Sputtering Lab18
KJ Lesker, Equipment Available For Use - Sputtering PVD75
KJ Lesker, Equipment Available For Use - Stepper AS200
GCA, Equipment Available For Use - Stress Measurement FLX-2320-S
Flexus, Equipment Available For Use - Surface Plasma Treatment nP12
Suss, Equipment Available For Use - Surface Profilometer 6M
Dektak, Equipment Available For Use - Surface Profilometer XT
Dektak, Equipment Available For Use - Vacuum Oven PB8-2B-CP
Yield Engineering Systems, Equipment Available For Use - Wafer Bonder 510
EV Group, Equipment Available For Use - Wafer Bonder 520IS
EV Group, Equipment Available For Use - Wafer Bonder SB-6E
Suss, Equipment Available For Use - Wafer Cleaner Trilennium
SSEC, Equipment Available For Use - Wire Bonder iBond 5000
MPP, Equipment Available For Use